( Lab-4)

Product Specification/Description:  

• Number of Target Nine (9)
• 3 Chamber C1- For Oxide, 3 Chamber C2- For Metal, 3 Chamber C3- For Parallel
• Turbo Molecular Pump (STPiX455C): Pumping speed for N₂ and H₂ is 300 l/s, Max. working pressure is 1.3 x 10^-1Pa,  Rated speed 55,000 rpm, Vacuum range upto 8.0E-7 Storage temperature range is -25 to 55 °C
• Rotary Pump: Vacuum range upto 5.0E-3
• RF 13.6 MHz for oxide metal chamber and DC 600 watt for sputtering metal
• SS Spherical chamber 14 to 16” dia, 3 sputter sources in confocal and sputter down configuration ( CF flange)
• Capable of rotation and heating a sample to 800 ^oC
• N type female RF connector, Shutter to be UHV compatible
• Pneumatic valve to isolate the pump (CF 150 flange) and gas inlets.
• Below sealed roughing valve and backing valve (Electroneumatic)
• Pirani gauge, Sample holder for heating 6” dia. sample to 800 ^oC
• Mass Flow Controllers
• Integrated with Plasma Enhanced Chemical Vapor Deposition (PECVD)