( Lab-2)

Product Specification/Description:  

• Beam Energy: 20 eV – 30 keV
• Fully Dgital electron optics column
• 100×100 mm travel range laser interferometer controlled stage
• 1nm XY position resolution at any working distance and write field size
• Write field from 0.5 µm to 2 µm with automated calibration and selection
• User defined write field from 0.5 µm to 2mm with automated calibration and selection
• 30mm variation in working distance at full interferometric control
• 20 MHz DSP controlled high speed pattern processor unit with dynamic scan corrections
• Compound electromagnetic-electrostatic immersion lens for lower beam aberrations
• Stage controlled in closed loop with dc-motor as main drives and shift piezos for fine positioning
• 3 fold vibration isolation system with pendulum dampers
• Raith Nanosuite software: eLine Plus FLEXposure pattering modes, SEM inspection, dimensional metrology software, Pico ampere meter with IEEE-interface, CCD Camera