Optical Lithography

Manufacturer Name/Country – EV Group Europe & Asia/Pacific GmbH (Austria)

Model Name- EVG 610

( Lab-2)

Product Specification/Description:  

  • Semi-automated Double Side Mask Alignment System (up to 150 mm, double side, manual handling) for wafer size up to 150 mm, Bond alignment optional
  • 350 W-500 W Light Source
  • Lamp 500 W Hg
  • Lamp 500 W HgXe for DUV
  • Optical Set for Wave Length Range 350 – 450 nm
  • Optical Set for Wave Length Range 200 – 240 nm
  • Digital Top Side Microscope: Travel range*: X: 36 (14) – 150 mm, Y: -70/7 +30 mm
  • Bottom* Side microscope: Travel range*: X: 32 (10) rnm – 100 mm; Y: ± l0 mm
  • Mask Holder for 2 x 2″, Mask Holder for 3 x 3″,  Mask Holder for 5 x 5″ Masks with Loading Frame
  • Vacuum Contact Wafer Chuck 2″, Chuck 3”, Chuck 5”
  • UV Power Meter, 365 nm for OAI 308 Probe & additional UV power meter Probe for 220 nm & 435 nm