Helium Ion Bean Lithography  

Manufacturer Name/Country – Carl Zeiss Microscopy (U.S.A)

Model Name- Nanofab He System

(Lab- 1)

Product Specification/Description:  

  • Beam energy: 10 – 35 kV
  • Beam Resolution: 0.5 nm
  • Chamber Internal dimensions: 280 x 280 x 260 mm (L x W x H)
  • Sample Stage: Motorized 5 axis eucentric stage, Stage travel: x = 50 mm, Y = 50 mm. z = 8 mm Rotation: 0 – 360′
  • Source Cooling: Liquid nitrogen
  • Vacuum System: Two 450 L/sec Meg-Lev turbomolecular pumps & one 40 L/sec ion Pump