Maskless Lithography

This instrument is used for pattering for device fabrication using CAD based Mask. This instrument has a resolution of 5 µm.

Instument image
1
Company
Intelligent Micro Patterning
Model
100 Xpress Maskless Exposure
Purpose
This instrument is used for pattering for device fabrication using CAD based Mask. This instrument has the resolution of 5 µm.