{"id":1169,"date":"2024-11-06T12:49:57","date_gmt":"2024-11-06T12:49:57","guid":{"rendered":"http:\/\/c4dfed.webshot.in\/?page_id=1169"},"modified":"2024-11-08T06:34:38","modified_gmt":"2024-11-08T06:34:38","slug":"multi-target-sputtering-system","status":"publish","type":"page","link":"https:\/\/c4dfed.iitmandi.ac.in\/?page_id=1169","title":{"rendered":"Multi-Target Sputtering System"},"content":{"rendered":"\t\t<div data-elementor-type=\"wp-page\" data-elementor-id=\"1169\" class=\"elementor elementor-1169\">\n\t\t\t\t<div class=\"elementor-element elementor-element-204d112 e-flex e-con-boxed e-con e-parent\" data-id=\"204d112\" data-element_type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t<div class=\"elementor-element elementor-element-a4049d7 e-con-full e-flex e-con e-child\" data-id=\"a4049d7\" data-element_type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-26bd934 elementor-widget elementor-widget-text-editor\" data-id=\"26bd934\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<h2 style=\"text-align: center;\"><b><\/b><span style=\"color: #000000;\"><strong>Multi-Target Sputtering System<\/strong><\/span><\/h2><p style=\"text-align: center;\"><span style=\"color: #000000;\"><strong>Manufacturer Name\/Country &#8211; Custom Made Indigenously Item @ IIT-Mandi and partially designed by Advanced Process Technology Pvt. Ltd (India)<\/strong><\/span><\/p><p style=\"text-align: center;\"><span style=\"color: #000000;\"><strong>Model Name- Self Assembled<\/strong><\/span><\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-1e0f373 elementor-widget elementor-widget-image\" data-id=\"1e0f373\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img fetchpriority=\"high\" decoding=\"async\" width=\"2560\" height=\"1440\" src=\"https:\/\/c4dfed.iitmandi.ac.in\/wp-content\/uploads\/2024\/10\/sputtering-system.jpg\" class=\"attachment-full size-full wp-image-635\" alt=\"\" srcset=\"https:\/\/c4dfed.iitmandi.ac.in\/wp-content\/uploads\/2024\/10\/sputtering-system.jpg 2560w, https:\/\/c4dfed.iitmandi.ac.in\/wp-content\/uploads\/2024\/10\/sputtering-system-1024x576.jpg 1024w, https:\/\/c4dfed.iitmandi.ac.in\/wp-content\/uploads\/2024\/10\/sputtering-system-768x432.jpg 768w, https:\/\/c4dfed.iitmandi.ac.in\/wp-content\/uploads\/2024\/10\/sputtering-system-600x338.jpg 600w\" sizes=\"(max-width: 2560px) 100vw, 2560px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-b136331 elementor-widget elementor-widget-spacer\" data-id=\"b136331\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div class=\"elementor-element elementor-element-b658c03 e-con-full e-flex e-con e-child\" data-id=\"b658c03\" data-element_type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-71d35ee elementor-widget elementor-widget-text-editor\" data-id=\"71d35ee\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<h4><span style=\"color: #000000;\"><strong>( Lab-4)<\/strong><\/span><\/h4><p><strong><span style=\"color: #000000;\">Product Specification\/Description: \u00a0<\/span><\/strong><\/p><ul><li><span style=\"color: #000000;\">Number of Target Nine (9)<\/span><\/li><li><span style=\"color: #000000;\">3 Chamber C1- For Oxide, 3 Chamber C2- For Metal, 3 Chamber C3- For Parallel<\/span><\/li><li><span style=\"color: #000000;\">Turbo Molecular Pump (STPiX455C): Pumping speed for N<sub>2 <\/sub>and H<sub>2 <\/sub>is 300 l\/s, Max. working pressure is 1.3 x 10<sup>-1<\/sup>Pa,\u00a0 Rated speed 55,000 rpm, Vacuum range upto 8.0E-7 Storage temperature range is -25 to 55 \u00b0C<\/span><\/li><li><span style=\"color: #000000;\">Rotary Pump: Vacuum range upto 5.0E-3<\/span><\/li><li><span style=\"color: #000000;\">RF 13.6 MHz for oxide metal chamber and DC 600 watt for sputtering metal<\/span><\/li><li><span style=\"color: #000000;\">SS Spherical chamber 14 to 16\u201d dia, 3 sputter sources in confocal and sputter down configuration ( CF flange)<\/span><\/li><li><span style=\"color: #000000;\">Capable of rotation and heating a sample to 800 <sup>o<\/sup>C<\/span><\/li><li><span style=\"color: #000000;\">N type female RF connector, Shutter to be UHV compatible<\/span><\/li><li><span style=\"color: #000000;\">Pneumatic valve to isolate the pump (CF 150 flange) and gas inlets.<\/span><\/li><li><span style=\"color: #000000;\">Below sealed roughing valve and backing valve (Electroneumatic)<\/span><\/li><li><span style=\"color: #000000;\">Pirani gauge, Sample holder for heating 6\u201d dia. sample to 800 <sup>o<\/sup>C<\/span><\/li><li><span style=\"color: #000000;\">Mass Flow Controllers<\/span><\/li><li><span style=\"color: #000000;\">Integrated with Plasma Enhanced Chemical Vapor Deposition (PECVD)<\/span><\/li><\/ul>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t","protected":false},"excerpt":{"rendered":"<p>Multi-Target Sputtering System Manufacturer Name\/Country &#8211; Custom Made Indigenously Item @ IIT-Mandi and partially designed by Advanced Process Technology Pvt. Ltd (India) Model Name- Self Assembled ( Lab-4) Product Specification\/Description: [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-1169","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1169","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=1169"}],"version-history":[{"count":10,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1169\/revisions"}],"predecessor-version":[{"id":1316,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1169\/revisions\/1316"}],"wp:attachment":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=1169"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}