{"id":1127,"date":"2024-11-06T12:23:41","date_gmt":"2024-11-06T12:23:41","guid":{"rendered":"http:\/\/c4dfed.webshot.in\/?page_id=1127"},"modified":"2024-11-08T06:31:02","modified_gmt":"2024-11-08T06:31:02","slug":"optical-lithography","status":"publish","type":"page","link":"https:\/\/c4dfed.iitmandi.ac.in\/?page_id=1127","title":{"rendered":"Optical Lithography"},"content":{"rendered":"\t\t
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<\/b>Optical Lithography<\/strong><\/span><\/h2>

Manufacturer Name\/Country – EV Group Europe & Asia\/Pacific GmbH (Austria)<\/strong><\/span><\/p>

Model Name- EVG 610<\/strong><\/span><\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t

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( Lab-2)<\/strong><\/span><\/h4>

Product Specification\/Description: \u00a0<\/span><\/strong><\/p>

  • Semi-automated Double Side Mask Alignment System (up to 150 mm, double side, manual handling) for wafer size up to 150 mm, Bond alignment optional<\/span><\/li>
  • 350 W-500 W Light Source<\/span><\/li>
  • Lamp 500 W Hg<\/span><\/li>
  • Lamp 500 W HgXe for DUV<\/span><\/li>
  • Optical Set for Wave Length Range 350 – 450 nm<\/span><\/li>
  • Optical Set for Wave Length Range 200 – 240 nm<\/span><\/li>
  • Digital Top Side Microscope: Travel range*: X: 36 (14) – 150 mm, Y: -70\/7 +30 mm<\/span><\/li>
  • Bottom* Side microscope: Travel range*: X: 32 (10) rnm – 100 mm; Y: \u00b1 l0 mm<\/span><\/li>
  • Mask Holder for 2 x 2″, Mask Holder for 3 x 3″,\u00a0 Mask Holder for 5 x 5″ Masks with Loading Frame<\/span><\/li>
  • Vacuum Contact Wafer Chuck 2″, Chuck 3\u201d, Chuck 5\u201d<\/span><\/li>
  • UV Power Meter, 365 nm for OAI 308 Probe & additional UV power meter Probe for 220 nm & 435 nm<\/span><\/li><\/ul>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t","protected":false},"excerpt":{"rendered":"

    Optical Lithography Manufacturer Name\/Country – EV Group Europe & Asia\/Pacific GmbH (Austria) Model Name- EVG 610 ( Lab-2) Product Specification\/Description: \u00a0 Semi-automated Double Side Mask Alignment System (up to 150 […]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-1127","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1127","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=1127"}],"version-history":[{"count":10,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1127\/revisions"}],"predecessor-version":[{"id":1292,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1127\/revisions\/1292"}],"wp:attachment":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=1127"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}