{"id":1122,"date":"2024-11-06T12:20:37","date_gmt":"2024-11-06T12:20:37","guid":{"rendered":"http:\/\/c4dfed.webshot.in\/?page_id=1122"},"modified":"2024-11-08T06:30:34","modified_gmt":"2024-11-08T06:30:34","slug":"electron-beam-lithography-ebl","status":"publish","type":"page","link":"https:\/\/c4dfed.iitmandi.ac.in\/?page_id=1122","title":{"rendered":"Electron Beam Lithography EBL"},"content":{"rendered":"\t\t<div data-elementor-type=\"wp-page\" data-elementor-id=\"1122\" class=\"elementor elementor-1122\">\n\t\t\t\t<div class=\"elementor-element elementor-element-a43ef57 e-flex e-con-boxed e-con e-parent\" data-id=\"a43ef57\" data-element_type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t<div class=\"elementor-element elementor-element-21f1f14 e-con-full e-flex e-con e-child\" data-id=\"21f1f14\" data-element_type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-832d6a0 elementor-widget elementor-widget-text-editor\" data-id=\"832d6a0\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<h2 style=\"text-align: center;\"><b><\/b><span style=\"color: #000000;\"><strong>Electron Beam Lithography EBL<\/strong><\/span><\/h2><p style=\"text-align: center;\"><span style=\"color: #000000;\"><strong>Manufacturer Name\/Country &#8211; Raith GmbH (Germany)<\/strong><\/span><\/p><p style=\"text-align: center;\"><span style=\"color: #000000;\"><strong>Model Name- 1011:eLINE Plus<\/strong><\/span><\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4aefe3d elementor-widget elementor-widget-image\" data-id=\"4aefe3d\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img fetchpriority=\"high\" decoding=\"async\" width=\"1024\" height=\"687\" src=\"https:\/\/c4dfed.iitmandi.ac.in\/wp-content\/uploads\/2024\/10\/electron-beam-lithography.jpg\" class=\"attachment-full size-full wp-image-648\" alt=\"\" srcset=\"https:\/\/c4dfed.iitmandi.ac.in\/wp-content\/uploads\/2024\/10\/electron-beam-lithography.jpg 1024w, https:\/\/c4dfed.iitmandi.ac.in\/wp-content\/uploads\/2024\/10\/electron-beam-lithography-768x515.jpg 768w, https:\/\/c4dfed.iitmandi.ac.in\/wp-content\/uploads\/2024\/10\/electron-beam-lithography-600x403.jpg 600w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-2fb61fc elementor-widget elementor-widget-spacer\" data-id=\"2fb61fc\" data-element_type=\"widget\" data-widget_type=\"spacer.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-spacer\">\n\t\t\t<div class=\"elementor-spacer-inner\"><\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div class=\"elementor-element elementor-element-2a13f89 e-con-full e-flex e-con e-child\" data-id=\"2a13f89\" data-element_type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-6bf4fcd elementor-widget elementor-widget-text-editor\" data-id=\"6bf4fcd\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<h4><span style=\"color: #000000;\"><strong>( Lab-2)<\/strong><\/span><\/h4><p><strong><span style=\"color: #000000;\">Product Specification\/Description: \u00a0<\/span><\/strong><\/p><ul><li><span style=\"color: #000000;\">Beam Energy: 20 eV \u2013 30 keV<\/span><\/li><li><span style=\"color: #000000;\">Fully Dgital electron optics column<\/span><\/li><li><span style=\"color: #000000;\">100\u00d7100 mm travel range laser interferometer controlled stage<\/span><\/li><li><span style=\"color: #000000;\">1nm XY position resolution at any working distance and write field size<\/span><\/li><li><span style=\"color: #000000;\">Write field from 0.5 \u00b5m to 2 \u00b5m with automated calibration and selection<\/span><\/li><li><span style=\"color: #000000;\">User defined write field from 0.5 \u00b5m to 2mm with automated calibration and selection<\/span><\/li><li><span style=\"color: #000000;\">30mm variation in working distance at full interferometric control<\/span><\/li><li><span style=\"color: #000000;\">20 MHz DSP controlled high speed pattern processor unit with dynamic scan corrections<\/span><\/li><li><span style=\"color: #000000;\">Compound electromagnetic-electrostatic immersion lens for lower beam aberrations<\/span><\/li><li><span style=\"color: #000000;\">Stage controlled in closed loop with dc-motor as main drives and shift piezos for fine positioning<\/span><\/li><li><span style=\"color: #000000;\">3 fold vibration isolation system with pendulum dampers<\/span><\/li><li><span style=\"color: #000000;\">Raith Nanosuite software: eLine Plus FLEXposure pattering modes, SEM inspection, dimensional metrology software, Pico ampere meter with IEEE-interface, CCD Camera<\/span><\/li><\/ul>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t","protected":false},"excerpt":{"rendered":"<p>Electron Beam Lithography EBL Manufacturer Name\/Country &#8211; Raith GmbH (Germany) Model Name- 1011:eLINE Plus ( Lab-2) Product Specification\/Description: \u00a0 Beam Energy: 20 eV \u2013 30 keV Fully Dgital electron optics [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-1122","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1122","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=1122"}],"version-history":[{"count":10,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1122\/revisions"}],"predecessor-version":[{"id":1289,"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=\/wp\/v2\/pages\/1122\/revisions\/1289"}],"wp:attachment":[{"href":"https:\/\/c4dfed.iitmandi.ac.in\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=1122"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}